Photocatalytic glass manufacturing method

[China Glass Network ] <Application No.> 03132335

<Applicant> Taibo Changjiang Glass Co., Ltd.

The invention discloses a method for manufacturing photocatalyst glass, which overcomes the disadvantages of poor flexibility in the diversified production of the so-called self-cleaning glass produced now, thereby increasing the inventory pressure and being difficult to adjust according to the expectations of different owners and architects. Production conditions. The film is coated with titanium dioxide on the surface of the glass by vacuum sputtering, and the operating pressure during vacuum sputtering is 1×10-3 mb~3×10-3 mb, and the gas passing through is 280-350 sccm. Argon gas, 150 to 260 sccm of oxygen, and 5 to 20 sccm of nitrogen gas have a film thickness of 100 to 200 nm, and the emissivity of the coating film is 0.75 to 0.9. The method of the invention can be produced in a single piece, can also be mass-produced on-line, and can meet the different needs of customers through cathode power, transportation speed, gas content, film thickness control and elastic adjustment of optical data.

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